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Variable frequency and quantitative capacitance measurements in dual bias modulation electrostatic force microscopy
http://hdl.handle.net/10061/0002001269
http://hdl.handle.net/10061/00020012690a12d129-14a8-439b-b310-18caaff588d0
| 名前 / ファイル | ライセンス | アクション |
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fulltext (1.3 MB)
Download is available from 2026/6/9.
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| アイテムタイプ | 学術雑誌論文 / Journal Article(1) | |||||||||||||
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| 公開日 | 2025-11-10 | |||||||||||||
| 日付 | ||||||||||||||
| 日付 | 2026-06-09 | |||||||||||||
| 日付タイプ | Available | |||||||||||||
| タイトル | ||||||||||||||
| タイトル | Variable frequency and quantitative capacitance measurements in dual bias modulation electrostatic force microscopy | |||||||||||||
| 言語 | ||||||||||||||
| 言語 | eng | |||||||||||||
| 資源タイプ | ||||||||||||||
| 資源タイプ | review article | |||||||||||||
| アクセス権 | ||||||||||||||
| アクセス権 | embargoed access | |||||||||||||
| 著者 |
福澤, 亮太
× 福澤, 亮太
× Takahashi, Takuji
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| 抄録 | ||||||||||||||
| 内容記述タイプ | Abstract | |||||||||||||
| 内容記述 | Electrostatic force microscopy (EFM) has been used to investigate the local electronic properties of materials, although frequency response and quantitative capacitance measurements are difficult in conventional EFM because of its narrow measurement bandwidth and insufficient quantitativity. In this paper, we introduce dual bias modulation EFM (DEFM) as a method for achieving variable frequency measurements and quantitative capacitance analysis. Dual bias modulation technique enables independent control of a frequency pair (ω1, ω2) for electrical modulation while a differential frequency, such as ω2 − ω1 and/or ω2 − 2ω1, is kept constant, and this frequency component in the electrostatic force is extracted. We confirmed the effectiveness of DEFM through experiments on Si and Cu(In,Ga)Se2 solar cell materials, where clear frequency responses were observed. Furthermore, the quantitative analysis of capacitance between a tip and sample in DEFM was validated by comparing carrier density values estimated from surface depletion capacitance with those from conventional Hall effect measurements. These results reveal that DEFM is an effective technique for analyzing local defects in semiconductors. | |||||||||||||
| 書誌情報 |
en : Japanese Journal of Applied Physics 巻 64, 号 6, ページ数 10, 発行日 2025-06-09 |
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| 出版者 | IOP Publishing | |||||||||||||
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| 収録物識別子タイプ | EISSN | |||||||||||||
| 収録物識別子 | 1347-4065 | |||||||||||||
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| 関連タイプ | isVersionOf | |||||||||||||
| 識別子タイプ | DOI | |||||||||||||
| 関連識別子 | https://doi.org/10.35848/1347-4065/addad0 | |||||||||||||
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| 関連タイプ | isVersionOf | |||||||||||||
| 識別子タイプ | URI | |||||||||||||
| 関連識別子 | https://iopscience.iop.org/article/10.35848/1347-4065/addad0 | |||||||||||||
| 権利 | ||||||||||||||
| 権利情報Resource | https://creativecommons.org/licenses/by-nc-nd/4.0/ | |||||||||||||
| 権利情報 | © 2025 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved. This is the Accepted Manuscript version of an article accepted for publication in Japanese Journal of Applied Physics. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at https://doi.org/10.35848/1347-4065/addad0 . This Accepted Manuscript is available for reuse under a CC BY-NC-ND licence after the 12 month embargo period provided that all the terms of the licence are adhered to. 出版社許諾条件により、本文は2026年6月9日以降に公開。 | |||||||||||||
| 著者版フラグ | ||||||||||||||
| 出版タイプ | AM | |||||||||||||
| 助成情報 | ||||||||||||||
| 助成機関名 | Japan Society for the Promotion of Science (JSPS) | |||||||||||||
| 研究課題番号 | JP17H02783 | |||||||||||||
| 研究課題番号URI | https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-17H02783/ | |||||||||||||
| 研究課題名 | 光援用ナノプローブによる多元系半導体太陽電池中の光励起キャリアダイナミクスの解明 | |||||||||||||
