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  1. 04 物質創成科学
  2. 01 学術雑誌論文

Dual Role of AgNO3 as an Oxidizer and Chloride Remover toward Enhanced Combustion Synthesis of Low-Voltage and Low-Temperature Amorphous Rare Metal-Free Oxide Thin-Film Transistors

http://hdl.handle.net/10061/0002000670
http://hdl.handle.net/10061/0002000670
85f155f6-5c84-42f2-9baa-b1cdb5c2df90
アイテムタイプ 学術雑誌論文 / Journal Article(1)
公開日 2024-11-19
タイトル
タイトル Dual Role of AgNO3 as an Oxidizer and Chloride Remover toward Enhanced Combustion Synthesis of Low-Voltage and Low-Temperature Amorphous Rare Metal-Free Oxide Thin-Film Transistors
言語
言語 eng
キーワード
主題Scheme Other
主題 oxide semiconductor
キーワード
主題Scheme Other
主題 combustion synthesis
キーワード
主題Scheme Other
主題 tin oxide
キーワード
主題Scheme Other
主題 low-temperature fabrication
キーワード
主題Scheme Other
主題 rare-metal-free
キーワード
主題Scheme Other
主題 TFT chloride remover
資源タイプ
資源タイプ journal article
アクセス権
アクセス権 open access
著者 Quino, Candell Grace P.

× Quino, Candell Grace P.

en Quino, Candell Grace P.

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Bermundo, Juan Paolo

× Bermundo, Juan Paolo

WEKO 35606

en Bermundo, Juan Paolo

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Kawanishi, Hidenori

× Kawanishi, Hidenori

en Kawanishi, Hidenori

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浦岡, 行治

× 浦岡, 行治

WEKO 207
e-Rad_Researcher 20314536

ja 浦岡, 行治

ja-Kana ウラオカ, ユキハル

en Uraoka, Yukiharu

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抄録
内容記述タイプ Abstract
内容記述 SnO2 transistors show great promise as an alternative to existing In2O3-based transistors, considering their abundance and similar electronic properties. However, they suffer from highly negative on-voltages, large subthreshold swings, and high processing temperatures. One of the reasons for this is the residual chloride in the SnO2 film, which negatively impacts the transistor by increasing the defects or acting as a dopant, thereby shifting the turn-on voltage negatively and increasing the subthreshold swing. Herein, we present a facile method of producing SixSnyO films with fewer chloride impurities, which can be used in high-performance, solution-processed TFTs. We employed AgNO3 as an oxidizer for a low-temperature combustion reaction at 300 °C, which simultaneously acts as a chloride remover. We successfully reduced the turn-on voltage from $221235.0 to $22120.7 V using this route. The subthreshold swing was decreased from 2.91 to 0.32 V/dec using the same Sn concentration. The highest mobility obtained was 1.92 cm2/(V s) from the 0.25 M Sn precursor at a low drain voltage of 0.1 V. This method can be used as a general route for fabricating solution process-based SnO2 TFTs and further expanding its application to flexible devices via low-temperature combustion.
書誌情報 en : ACS Applied Electronic Materials

巻 6, 号 1, p. 505-513, 発行日 2024-01-09
出版者
出版者 American Chemical Society
ISSN
収録物識別子タイプ EISSN
収録物識別子 2637-6113
出版者版DOI
関連タイプ isReplacedBy
識別子タイプ DOI
関連識別子 https://doi.org/10.1021/acsaelm.3c01479
出版者版URI
関連タイプ isReplacedBy
識別子タイプ URI
関連識別子 https://pubs.acs.org/doi/10.1021/acsaelm.3c01479
権利
権利情報Resource https://creativecommons.org/licenses/by/4.0/
権利情報 $00A9 2024 The Authors. Published by American Chemical Society. This publication is licensed under CC-BY 4.0 .
著者版フラグ
出版タイプ NA
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